Plasma-Therm
Three Plasma-Therm systems have been ordered by the University of Delaware for its newly expanded Nanofabrication Laboratory.
The nanofab facility, managed by the Electrical and Computer Engineering Department, supports numerous university departments and disciplines, as well as other universities and private industry.
The university ordered two Apex SLR inductively coupled plasma (ICP) etching systems, and a VERSALINE plasma enhanced chemical vapor deposition (PECVD) system. The systems perform enhanced etching and thin-film deposition for semiconductor device and circuit fabrication, microsystems and MEMS technology, nanophotonics, and nanobiotechnology. They will aid university scientists and outside researchers to solve challenges in energy, national security, human health, and information technology. The new systems will complement existing Plasma-Therm equipment, and are expected to strongly contribute to the silicon photonics program, which addresses the next generation of photonics-electronics integration.
“Being selected by such a prestigious university to propel its research efforts allows Plasma-Therm to stay connected to important trends in material and device processing,” noted Dr. David Lishan, Plasma-Therm Principal Scientist and Director.
“As a result of our partnership we see the problems and challenges that researchers are working to overcome, and become a part of those efforts,” Lishan continued. “When we augment our process and service support with outreach programs such as workshops on plasma processing, partners such as the U.D. Nanofabrication Facility receive additional value.”